Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1974-06-19
1976-04-06
Scott, James R.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
317258, 357 4, 75138, 75174, 204 15, 156 7, 333 70CR, H02B 104, B05D 512, H01L 2712
Patent
active
039492753
ABSTRACT:
An electric thin-film circuit has a conductor path and at least one capacitor and/or one resistor, and it comprises a substrate base member with a first tantalum-aluminum-alloy layer formed thereupon, and is etched to form the outline of the conductor path. A second tantalum-aluminum-alloy layer with a tantalum content of approximately 2 through 20 atomic percent is disposed thereupon, at least in the area of a capacitor, and an oxidation layer is formed upon this second tantalum-aluminum-alloy layer to constitute the capacitor dielectric. The conductor paths and the opposite capacitor electrode are formed of a conductive layer such as a nickel-chromium-gold layer.
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Scott James R.
Siemens Aktiengesellschaft
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