Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-08-06
1995-01-31
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204302, B03C 500
Patent
active
053856589
ABSTRACT:
A system for contacting liquid phases comprising a column for transporting a liquid phase contacting system, the column having upper and lower regions. The upper region has a nozzle for introducing a dispersed phase and means for applying thereto a vertically oriented high intensity pulsed electric field. This electric field allows improved flow rates while shattering the dispersed phase into many micro-droplets upon exiting the nozzle to form a dispersion within a continuous phase. The lower region employs means for applying to the dispersed phase a horizontally oriented high intensity pulsed electric field so that the dispersed phase undergoes continuous coalescence and redispersion while being urged from side to side as it progresses through the system, increasing greatly the mass transfer opportunity.
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Adams Harold W.
Leader William T.
Marasco Joseph A.
Martin Marietta Energy Systems Inc.
Niebling John
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