Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1985-11-15
1986-11-04
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
118503, 118730, 204298, 427 37, 427 38, 427 39, C23C 1500
Patent
active
046209131
ABSTRACT:
An improved method and apparatus for maintaining cathode spots in an electric arc vapor deposition coating process, on the desired cathode evaporation surface are disclosed. A primary anode is arranged, configured and biased within a vacuum deposition coating chamber relative to a cathodic source so as to maintain an electric arc therebetween. A relative biasing network maintains a voltage difference during deposition between the primary anode and other conductive surfaces within the chamber, or the chamber wall itself, such that electrons leaving the cathode are preferentially drawn toward the primary anode rather than to other conductive surfaces. The anode orientation within the chamber causes those electrons drawn toward it to tend to maintain the cathode spots on the desired cathode evaporation surface for maintaining arc stability at low arc current levels.
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Demers Arthur P.
Multi-Arc Vacuum Systems Inc.
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