Coating processes – Nonuniform coating – Mask or stencil utilized
Reexamination Certificate
2007-10-16
2007-10-16
Parker, Fred J. (Department: 1762)
Coating processes
Nonuniform coating
Mask or stencil utilized
Reexamination Certificate
active
09694074
ABSTRACT:
An elastomeric mask is provided that allows deposition of a variety of materials through mask openings. The mask seals effectively against substrate surfaces, allowing simple deposition from fluid phase, gas phase, and the like or removal of material using gaseous or liquid etchants. The mask then can be simply peeled from the surface of the substrate leaving the patterned material behind. Multi-layered mask techniques are described in which openings in an upper mask allow selected openings of a lower mask to remain un-shielded, while other openings of the lower mask are shielded. A first deposition step, following by re-orientation of the upper mask to expose a different set of lower mask openings, allows selective deposition of different materials in different openings of the lower mask. Pixelated organic electroluminescent devices are provided via the described technique.
REFERENCES:
patent: 4093754 (1978-06-01), Parsons
patent: 4097776 (1978-06-01), Allinikov
patent: 4119745 (1978-10-01), Smith
patent: 4493757 (1985-01-01), Piepers
patent: 4511599 (1985-04-01), Rustomji
patent: 4518636 (1985-05-01), Richards
patent: 4527988 (1985-07-01), Lutz et al.
patent: 4728591 (1988-03-01), Clark et al.
patent: 4777117 (1988-10-01), Murata et al.
patent: 4871671 (1989-10-01), Errede et al.
patent: 4988424 (1991-01-01), Woodward et al.
patent: 5077085 (1991-12-01), Schnur et al.
patent: 5147763 (1992-09-01), Kamitakahara
patent: 5155749 (1992-10-01), DiMilia et al.
patent: 5160959 (1992-11-01), Everett et al.
patent: 5259926 (1993-11-01), Kuwabara et al.
patent: 5480530 (1996-01-01), Zejda
patent: 5486452 (1996-01-01), Gordon et al.
patent: 5510628 (1996-04-01), Georger, Jr. et al.
patent: 5593814 (1997-01-01), Matsuda et al.
patent: 5665496 (1997-09-01), Omika et al.
patent: 5681661 (1997-10-01), Kelly
patent: 5691018 (1997-11-01), Kelley et al.
patent: 5705043 (1998-01-01), Zwerner et al.
patent: 5721131 (1998-02-01), Rudolph et al.
patent: 5914182 (1999-06-01), Drumheller
patent: 5948470 (1999-09-01), Harrison et al.
patent: 5976826 (1999-11-01), Singhvi et al.
patent: 6181144 (2001-01-01), Hembree et al.
patent: 6207369 (2001-03-01), Wohlstadter et al.
patent: 6355198 (2002-03-01), Kim et al.
patent: 6368838 (2002-04-01), Singhvi et al.
patent: 6645432 (2003-11-01), Anderson et al.
patent: 6660192 (2003-12-01), Kim et al.
patent: 6686184 (2004-02-01), Anderson et al.
patent: 6743633 (2004-06-01), Hunter
patent: 6752942 (2004-06-01), Kim et al.
patent: 6770721 (2004-08-01), Kim
patent: 2002/0029814 (2002-03-01), Unger et al.
patent: 2002/0134907 (2002-09-01), Benett et al.
patent: 2003/0156992 (2003-08-01), Anderson et al.
patent: 2004/0027675 (2004-02-01), Wu et al.
patent: 2004/0156988 (2004-08-01), Mehenti et al.
patent: 33 31 377 (1985-03-01), None
patent: 38 41 317 (1990-06-01), None
patent: 195 45 151 (1997-06-01), None
patent: 2 676 970 (1992-12-01), None
patent: 2 201 637 (1988-09-01), None
patent: 02232238 (1990-09-01), None
patent: WO96/15223 (1996-05-01), None
patent: WO97/33737 (1997-09-01), None
patent: WO99/54786 (1999-10-01), None
patent: WO 00/60356 (2000-10-01), None
patent: WO 01/70389 (2001-09-01), None
patent: WO 01/89787 (2001-11-01), None
patent: WO 01/89788 (2001-11-01), None
patent: WO 02/084340 (2002-10-01), None
MSDS for cadmium Oxide , updated Nov. 18, 2003.
Micromolding of Polymers in Capillaries: Applications in Microfabrication; Xia et al, Chem. Mater., 8, 1558-1567 (1996).
Patent Abstracts of Japan, vol. 014, No. 544.
X.D. Xiang et al., “A Combinatorial Approach to Materials Discovery”,Science, vol. 268, Jun. 23, 1995, pp. 1738-1740.
Author Unknown, “Lift Off Technique for High Temperature Metal Depositions”,IBM Technical Disclosure Bulletin. Dec. 1972, vol. 15, No. 7, p. 2305.
P. Yam, “Plastics Get Wired”,Scientific American, Jul. 1995, pp. 83-87.
E. M. Kirschner, “Electronic Chemicals”,C&EN, Nov. 24, 1997, pp. 25-39.
G. J. Burger et al., “High-resolution shadow-mask patterning in deep holes and its application to an electrical wafer feed-through”,Sensors and Actuators, A 54, 1996, pp. 669-673.
S. Noach et al., “Microfabrication of an electroluminescent polymer light emitting diode pixel array”,Appl. Phys. Lett., 69 (24), Dec. 9, 1996, pp. 3650-3652.
M. Renak et al., “Microlithographic Process for Patterning Conjugated Emissive Polymers”,Advanced Materials, 1997, 9, No. 5, pp. 392-394.
M. Granstrom et al., “Flexible Arrays of Submicrometer-Sized Polymeric Light Emitting Diodes”,Advanced Materials, 1995, 7, No. 12, pp. 1012-1015.
M. Granstrom et al., “Micrometer-and Nanometer-Sized Polymeric Light-Emitting Diodes”,Science, vol. 267, Mar. 10, 1995, pp. 1479-1481.
Z. Bao et al., “High-Performance Plastic Transistors Fabricated by Printing Techniques”,Chem Mater1997, 9, pp. 1299-1301.
W. W. Clegg et al., “The preparation of piezoceramic-polymer thick films and their application as micromechanical actuators”,Sensors and Actuators, A 58 (1997) pp. 173-177.
H. Goldberg et al., “Screen printing: a technology for the batch fabrication of integrated chemical-sensor arrays”,Sensors And Actuators, B 21 (1994) pp. 171-183.
F. Garnier et al., “All-Polymer Field-Effect Transistor Realized by Printing Techniques”,Science, vol. 265, Sep. 16, 1994, pp. 1684-1686.
Y. Mikami et al., “A New Patterning Process Concept for Large-Area Transistor Circuit Fabrication Without Using an Optical Mask Aligner”,IEEE, vol. 41, No. 1, Mar. 1994.
H. Lorenz et al., “Low-cost technology for multilayer electroplated parts using laminated dry film resist”,Sensors and Actuators, A 53 (1996) pp. 364-368.
S. Leppavuori et al., “A novel thick-film technique, gravure offset printing, for the realization of fine-line sensor structures”Sensors and Actuators, A 41-42 (1994) pp. 593-596.
V. Golovanov et al., “Different thick-film methods in printing of one-electrode semiconductor gas sensors”,Sensors and Actuators, B 34 (1996) pp. 401-406.
Y. Kijima et al., “RGB Luminescence from Passive-Matrix Organic LED's”,IEEE, vol. 44, No. 8, Aug. 1997, pp. 1222-1228.
Z. Shen et al, “Three-Color, Tunable, Organic Light-Emitting Devices”SCIENCE, vol. 276, Jun. 27, 1997, pp. 2009-2011.
P. E. Burrows et al., “Achieving Full-Color Organic Light-Emitting Devices for Lightweight, Flat-Panel Displays”,IEEE, vol. 44, No. 8, Aug. 1997, pp. 1188-1203.
G. Gustfsson et al., “Flexible light-emitting diodes made from soluble conducting polymers”,Nature, vol. 357, Jun. 11, 1992, pp. 477-479.
J. Wang et al., “Identification of a Blue Photoluminescent Composite Material from a Combinatorial Library”,SCIENCE, vol. 279, Mar. 13, 1998, pp. 1712-1714.
T. R. Hebner et al., “Ink-jet printing of doped polymers for organic light emitting devices”,Applied Physics Letters, vol. 72, No. 5, Feb. 2, 1998, pp. 519-521.
A. You et al., “A miniaturized array assay format for detecting small molecule-protein interactions in cells”,Chemistry&Biology, 1997, vol. 4, No. 12, pp. 969-975.
D. Duffy et al., “Patterning Electroluminescent Materials with Feature Sizes as Small as 5 μm Using Elastomeric Membranes as Masks for Dry Lift-Off”,Advanced Materials, 1999, 11, No. 7, pp. 546-552.
R. Jackman et al., “Using Elastomeric Membranes as Dry Resists and for Dry Lift-Off”,Langmuir1999, vol. 15, No. 8, pp. 2973-2984.
E. Ostuni et al., “Patterning Mammalian Cells Using Elastomeric Membranes”,Langmuir2000, No. 16, pp. 7811-7819.
K. Vaeth et al., “Transition Metals for Selective Chemical Vapor Deposition of Parylene-Based Poymers”,Chem. Mater2000, No. 12, pp. 1305-1313.
Astor et al., “Human Leukocyte Migration Inhibition in Agarose Using Four Antigens: Correlation with Skin Reactivity,”J. Immunology, vol. 110, No. 4, Apr. 1973, pp. 1174-1179.
Duffy David C.
Jackman Rebecca J.
Jensen Klavs F.
Vaeth Kathleen
Whitesides George M.
Parker Fred J.
President and Fellows of Harvard College
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