Effusion method and an effusion cell for forming molecular beams

Details Effusion method and an effusion cell for forming molecular beams Effusion method and an effusion cell for forming molecular beams

1992-07-31

1994-06-14

Berman, Jack I.

Radiant energy

Electrically neutral molecular or atomic beam devices and...

2504921, 2504922, H05H 302

Patent

active

053212606

ABSTRACT:
Primary molecules are formed by sublimation in a sublimation chamber (2), they are then transferred at a transfer flow-rate to a decomposition head (10) at a higher temperature, and they are transformed therein into secondary molecules that are lighter in weight to form molecular beams (16). In accordance with the invention, the transfer flow-rate is adjusted by adjusting an effective vector flow-rate which is the vector flow-rate of a vector gas inserted into the sublimation chamber via a feed tube (26) and sucked out via a suction tube (30). The invention applies, in particular, to making III-V type semiconductor components by molecular beam epitaxy.

REFERENCES:
patent: 3866039 (1975-02-01), Geller et al.
patent: 4664063 (1987-05-01), Ashizawa et al.
patent: 5025751 (1991-06-01), Takatani et al.
patent: 5034604 (1991-07-01), Streetman et al.
patent: 5120393 (1992-06-01), Kubo et al.
patent: 5128538 (1992-07-01), Genova et al.
Journal of Vacuum Science and Technology: Part B, vol. 8, No. 2, Mar. 1990, NY. US, pp. 168-171; R. N. Sacks et al.: "Evaluation of a new high capacity, all-tantalum molecular-beam-epitaxy arsenic cracker furnace".
Journal of Vacuum Science and Technolgy: Part B, vol. 6, No. 6, Nov. 1988, NY US, pp. 1667-1670; Mattord et al: "baffle-free refractory dimer arsenic source for molecular-beam epitaxy".
Journal of Vacuum Science and Technology: Part B, vol. 3, No. 3, May 1985, NY, US, pp. 823-829; D. Huet et al: "molecular beam epitaxy of In0.53Ga0.47As and InP on InP bys using cracker cells".

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