Effusion cell of a molecular beam epitaxy system

Details Effusion cell of a molecular beam epitaxy system Effusion cell of a molecular beam epitaxy system

1990-04-18

1992-12-15

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

118715, C23C 1424

Patent

active

051713705

ABSTRACT:
An apparatus with a crucible in an effusion cell of a molecular beam epitaxy system provides the crucible shaped and mounted in such a way that the molecular beam is optimized relative to the substrate. In particular, when a circular substrate is tilted relative to the beam direction, the shape of the crucible, of the crucible mount, and the alignment of the center axis of the crucible relative to the center axis of the cell are adapted to optimize the beam impingement on the substrate.

REFERENCES:
patent: 4239955 (1980-12-01), Cho
patent: 4543467 (1985-09-01), Eisele et al.
patent: 4646680 (1987-03-01), Maki
patent: 4800100 (1989-01-01), Herbots et al.
Article for Journal of Vacuum Science Tech., Jay A. Curless vol. 3, No. 2, Mar./Apr. 1985.
Patent Abstract of Japan 61-186284 (C-396) Jan. 9, 1987, vol. 11/No. 8.
Patent Abstract of Japan 61-91094 (C-372) Sep. 12, 1986 vol. 10/No. 269.
Patent Abstract of Japan 63-28210- (C-576) Mar. 14, 1989 vol. 13/No. 107.
Patent Abstract of Japan 63-252996 (C-567) Feb. 10, 1989 vol. 13/No. 61.

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