Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
Patent
1996-12-31
1999-09-21
Tran, Hien
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Waste gas purifier
422172, 422173, 422174, 55223, 552571, 55431, 55522, 406 46, 406 48, 406193, B01D 5334
Patent
active
059550376
ABSTRACT:
An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.
REFERENCES:
patent: 3898040 (1975-08-01), Tabak
patent: 4083607 (1978-04-01), Mott
patent: 4236464 (1980-12-01), Anderson et al.
patent: 4719088 (1988-01-01), Itoh et al.
patent: 4801437 (1989-01-01), Konagaya et al.
patent: 5009869 (1991-04-01), Weinberg et al.
patent: 5113789 (1992-05-01), Kamian
patent: 5118286 (1992-06-01), Sarin
patent: 5160707 (1992-11-01), Murray et al.
patent: 5252007 (1993-10-01), Klinzing et al.
patent: 5533890 (1996-07-01), Holst et al.
patent: 5575636 (1996-11-01), Kobayashi et al.
patent: 5599508 (1997-02-01), Martinelli et al.
Abrea, et al., Causes of anomalous solid formation in the exhaust system of low-pressure chemical vapor deposition plasma enhanced chemical vapor deposition semiconductor processes, J. Vac. Sci. Technol B 12(4) Jul./Aug. 1994, pp. 2763/2767.
Arya Prakash V.
Carpenter Kent
Holst Mark
Lane Scott
ATMI Ecosys Corporation
Hultquist Steven J.
Tran Hien
Zitzmann Oliver A. M.
LandOfFree
Effluent gas stream treatment system having utility for oxidatio does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Effluent gas stream treatment system having utility for oxidatio, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Effluent gas stream treatment system having utility for oxidatio will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-77252