Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Reexamination Certificate
2007-08-08
2009-11-03
Vanoy, Timothy C (Department: 1793)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
C423SDIG018, C422S105000, C422S108000, C422S111000, C422S168000, C422S169000, C422S170000, C422S171000
Reexamination Certificate
active
07611684
ABSTRACT:
An effluent gas scrubber and a method of scrubbing effluent gases are provided. An inlet port receives an effluent gas. The gas passes through successive chambers in which it is sprayed with a scrubbing fluid. An oxidizer within the scrubbing fluid is effective to oxidize non-water soluble gases within the effluent gas. An oxidation-reduction potential probe measures the oxidation-reduction potential of the scrubbing fluid and adds the oxidizer to the scrubbing fluid as needed. A pH probe measures the pH of the scrubbing fluid and adds a base to the scrubbing fluid as needed to maintain the pH at or above a threshold such as pH 7, or pH 12.
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Johnsgard Kris
Johnsgard Mark
Airgard, Inc.
Carr & Ferrell LLP
Vanoy Timothy C
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