X-ray or gamma ray systems or devices – Source
Patent
1994-05-02
1996-03-12
Porta, David P.
X-ray or gamma ray systems or devices
Source
378143, 2504931, H05G 200
Patent
active
054992826
ABSTRACT:
Methods for making pulsed and continuous discharge plasma light sources for extreme ultraviolet(EUV) projection lithography and soft-x-ray microscopy as well as other applications are disclosed. A first light source of doubly ionized lithium ions emits over a narrow bandwidth of approximately 13.5 nm. A second light source of beryllium ions radiates at approximately 7.60 nm. A third light source of boron ions radiates at approximately 4.86 nm, and a fourth light source of carbon ions radiates at approximately 3.38 nm. Preferred embodiments of apparatus for generating pulsed and continuous discharge sources are disclosed.
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Bruce David Vernon
Porta David P.
Steinberger Brian S.
University of Central Florida
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