Effective pad conditioning

Details Effective pad conditioning Effective pad conditioning

1997-10-30

2000-08-22

Scherbel, David A.

Abrading

Abrading process

With tool treating or forming

451 72, 451526, B24B 100

Patent

active

061063711

ABSTRACT:
An end effector to facilitate conditioning a surface of a polishing pad used in chemical-mechanical polishing of a substrate surface is described. The end effector includes an inwardly recessing contact surface capable of attaching to a conditioning disk having a conditioning surface such that the conditioning surface conforms to a substantial portion of the polishing pad, which protrudes outwardly under operation and thereby effectively conditions a substantial portion of the polishing pad. The present invention also describes a conditioning disk for effectively conditioning a surface of a polishing pad used in chemical-mechanical polishing of a substrate surface. The conditioning disk includes (i) a second surface capable of attaching to a contact surface of an end effector and (ii) an inwardly recessing conditioning surface that conforms to a substantial portion of said polishing pad, which protrudes outwardly under operation, and thereby effectively conditions the polishing pad. Processes and a chemical-mechanical polishing apparatuses employing the inventive end effectors or conditioning disks are also described.

REFERENCES:
patent: 5081051 (1992-01-01), Mattingly et al.
patent: 5216843 (1993-06-01), Breivogel et al.
patent: 5245790 (1993-09-01), Jerbic
patent: 5265378 (1993-11-01), Rostoker
patent: 5310455 (1994-05-01), Pasch et al.
patent: 5321304 (1994-06-01), Rostoker
patent: 5389194 (1995-02-01), Rostoker et al.
patent: 5403228 (1995-04-01), Pasch
patent: 5456627 (1995-10-01), Jackson et al.
patent: 5456630 (1995-10-01), Kaiser et al.
patent: 5516400 (1996-05-01), Pasch et al.
patent: 5527424 (1996-06-01), Mullins
patent: 5536202 (1996-07-01), Appel et al.
patent: 5547417 (1996-08-01), Breivogel et al.
patent: 5605499 (1997-02-01), Sugiyama et al.
patent: 5624304 (1997-04-01), Pasch et al.
patent: 5626715 (1997-05-01), Rostoker
patent: 5667433 (1997-09-01), Mallon
patent: 5861055 (1999-01-01), Allman et al.
patent: 5865666 (1999-02-01), Nagahara
patent: 5868608 (1999-02-01), Allman et al.
patent: 5882251 (1999-03-01), Berman et al.
patent: 5888120 (1999-03-01), Doran
patent: 5893756 (1999-04-01), Berman et al.
patent: 5948697 (1999-09-01), Hata
patent: 5957757 (1999-09-01), Berman

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