EEPROM including programming electrode extending through the con

Static information storage and retrieval – Floating gate – Particular biasing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

365218, 357 235, 437 43, G11C 1140, H01L 2978

Patent

active

048538957

ABSTRACT:
An electrically erasable, programmable read only memory (EEPROM) having an erase window directly overlying both a control gate layer (24) and a column line (12) is disclosed. Column lines (12) are implanted into a semiconductor substrate (16) and covered with a first insulating layer (18). A floating gate layer (20) overlies the first insulating layer (18) and is covered with a second insulating layer (22). The control gate layer (24) overlies the second insulating layer (22) and is covered by a third insulating layer (26). A passage (28) extends through the third insulating layer (26), control gate layer (24) and second insulating layer (22) and contains a sidewall insulator (30) on walls thereof. A tunnel oxide (32) resides within the passage (28) and is contacted by a programming electrode layer (34) which additionally overlies the third insulating layer (26) and fills the passage (28).

REFERENCES:
patent: 4405995 (1983-09-01), Shirai et al.
patent: 4561004 (1985-12-01), Kuo et al.
patent: 4742492 (1988-05-01), Smayling et al.
patent: 4750024 (1988-06-01), Schreck

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

EEPROM including programming electrode extending through the con does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with EEPROM including programming electrode extending through the con, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and EEPROM including programming electrode extending through the con will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-137115

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.