Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2005-03-15
2005-03-15
Nguyen, Henry Hung (Department: 2851)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S053000
Reexamination Certificate
active
06867842
ABSTRACT:
There is provided an edge rinse apparatus and an edge rinse method in which a swelling of an end portion of a resist produced by an edge rinse is eliminated. The resist coated on an unnecessary portion is exposed and is developed by using the edge rinse apparatus including a substrate chuck for sucking and holding a substrate, a motor for rotating the substrate chuck, a nozzle for discharging a developing solution to a principal surface of the substrate, a nozzle for discharging the developing solution to a rear surface of the substrate, and an exposure means with the substrate chuck as a mask.
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Research Disclosure, “Novel Edge Bead Removal Process”, Nov. 1991, No. 331, Kenneth Mason Publication, Ltd, England.*
Research Disclosure, “Edge-of Wafer System for Clearing Photoresist from wafers”, Aug. 1989, No. 304, Kenneth Maso Publications, Ltd, England.
Cook Alex McFarron Manzo Cummings & Mehler, Ltd.
Nguyen Henry Hung
Semiconductor Energy Laboratory Co,. Ltd.
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