Edge emitting laser with circular beam

Coherent light generators – Particular active media – Semiconductor

Reexamination Certificate

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C372S046014

Reexamination Certificate

active

07031361

ABSTRACT:
An edge emitting laser with circular beam using a low-carrier-mobility diluted nitride semiconductor material for an epitaxy light-emitting layer is disclosed. The low-carrier-mobility material can greatly suppress surface recombination of carriers. The epitaxy structure established on the substrate surface includes, from bottom to top, a bottom cladding layer, a bottom waveguide layer, a light-emitting layer, an upper waveguide layer, an upper cladding layer, and an electrode contact layer. The light-emitting layer is formed from a diluted nitride material. Etching is performed from the epitaxy structure through the light-emitting layer, forming a ridge waveguide that has a large reflective index difference between the light-emitting layer and the dielectric passivation layer.

REFERENCES:
patent: 5289484 (1994-02-01), Hayakawa
patent: 5815521 (1998-09-01), Hobson et al.
patent: 2004/0047378 (2004-03-01), Erbert et al.
Lin et al. “Extremely Small Vertical Far-Field Angle of InGaAs-AlGaAs Quantum-Well Lasers with Specifically Designed Cladding Structure”, IEEE Photonics Technology Lettters, vol. 8, No. 12, pp. 1588-1590.
Jeon et al. IEEE Journal of Selected Topics in Quantum Electronics, vol. 3 No. 6, pp. 1344-1350.

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