ECR plasma generator and an ECR system using the generator

Details ECR plasma generator and an ECR system using the generator ECR plasma generator and an ECR system using the generator

1998-07-02

2000-12-05

Mills, Gregory

Coating apparatus

Gas or vapor deposition

With treating means

156345, 427571, 118723MR, 118723MA, C23C 1600, H05H 100, H05H 102

Patent

active

061552003

ABSTRACT:
In an ECR plasma generator, radio frequency ranging from 3 to 300 MHz is applied from a radio frequency power supply to an electrode which is provided in a chamber having an exhaust system and which serves as a shower head for gas introduction, and power is supplied to a coil provided at the outer periphery of the chamber, so as to form a magnetic field an integer number of times as large as a resonant magnetic field corresponding to the applied radio frequency, parallel with the direction of an electric field and to generate ECR plasma in an atmosphere of the supplied process gas.

REFERENCES:
patent: 5266153 (1993-11-01), Thomas
patent: 5431769 (1995-07-01), Kisakibaru et al.
patent: 5585012 (1996-12-01), Wu et al.
patent: 5607542 (1997-03-01), Wu et al.

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