Coating apparatus – Gas or vapor deposition – With treating means
Patent
1993-10-25
1995-11-14
Chaudhuri, Olik
Coating apparatus
Gas or vapor deposition
With treating means
118723MR, 333252, 31511141, 31511171, 31511181, C23C 1600
Patent
active
054662958
ABSTRACT:
A plurality of magnetized elements form a continuous surface proximate to a waveguide opening, sufficient to satisfy electron cyclotron resonance plasma generation. With the elements similarly magnetized in a direction perpendicular to their central axis and parallel to the plane in which they are situated, a continuous resonance surface may be formed without the need for an externally applied magnetic field. Other magnetization orientations, such as perpendicular to the plane of the elements, may require an external magnetic field, such as that derived from solenoidal coils, but of a magnitude substantially reduced due to the combined field supplied by the elements. The invention may be used with rectangular or circular waveguides with or without a dielectric window, and a magnetizable strip of material may be disposed peripherally around the plane within which magnetized elements rest in order to displace the resonance surface away from the elements, allowing the elements to be disposed outside of the plasma-processing chamber. Ferrite material may be placed in the gaps between the elements to strengthen the overall combined field and the displaced resonance surface.
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Planar for Plasma Sources; AJA International Brochure (date unknown).
Board of Regents Acting for the Univ. of Michigan
Chaudhuri Olik
Dutton Brian K.
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