Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1992-02-28
1993-10-26
Mottola, Steven
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31323131, H01J 1726
Patent
active
052569381
ABSTRACT:
An Advanced Electron Cyclotron Resonance ion source (10) having an electron gun (52) for introducing electrons into the plasma chamber (18) of the ion source (10). The ion source (10) has a injection enclosure (12) and a plasma chamber tank (14). The plasma chamber (18) is defined by a plurality of longitudinal magnets (16). The electron gun (52) injects electrons axially into the plasma chamber (18) such that ionization within the plasma chamber (18) occurs in the presence of the additional electrons produced by the electron gun (52). The electron gun (52) has a cathode (116) for emitting electrons therefrom which is heated by current supplied from an AC power supply (96) while bias potential is provided by a bias power supply (118). A concentric inner conductor (60) and Outer conductor (62) carry heating current to a carbon chuck (104) and carbon pusher (114) Which hold the cathode (116) in place and also heat the cathode (16). In the Advanced Electron Cyclotron Resonance ion source (10), the electron gun (52) replaces the conventional first stage used in prior art electron cyclotron resonance ion generators.
REFERENCES:
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patent: 4616157 (1986-10-01), Naylor et al.
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patent: 4789839 (1988-12-01), Morris
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IEEE Dictionary of Electrical & Electronics Terms 3rd ed pp. 305 1984.
Operating Experience with the L.B.L. ECR Source by C. M. Lyneis dated bef the invention thereof by applicant.
Lyneis Claude M.
Xie Zu Q.
Gaither Roger S.
Moser William R.
Mottola Steven
Shingleton Michael
The United States of America as represented by the Department of
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