Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly single metal coating
Reexamination Certificate
2007-02-27
2007-02-27
Wong, Edna (Department: 1753)
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Depositing predominantly single metal coating
C205S238000
Reexamination Certificate
active
10788571
ABSTRACT:
Electrochemical plating polymer additives and method which reduces metal overburden in an electroplated metal while optimizing gap fill capability are disclosed. The polymer additives are provided in an electrochemical plating bath solution and may include low cationic charge density co-polymers having aromatic and amine functional group monomers. The low cationic charge density polymers may include benzene or pyrollidone functional group monomers and imidazole or imidazole derivative functional group monomers.
REFERENCES:
patent: 4468291 (1984-08-01), Naarmann et al.
patent: 5527434 (1996-06-01), Hamnett et al.
patent: 60017092 (1985-01-01), None
Shih Chien-Hsueh
Shue Shaulin
Taiwan Semiconducotr Manufacturing Co., Ltd.
Thomas Kayden Horstemeyer & Risley
Wong Edna
LandOfFree
ECP polymer additives and method for reducing overburden and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with ECP polymer additives and method for reducing overburden and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and ECP polymer additives and method for reducing overburden and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3871130