E-beam exposure apparatus

Details E-beam exposure apparatus E-beam exposure apparatus

2011-05-10

2011-05-10

Kim, Robert (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S492200, C250S492300, C250S306000, C250S307000

Reexamination Certificate

active

07939813

ABSTRACT:
An e-beam exposure apparatus includes an electron gun provide an e-beam for exposure to a resist layer formed on a substrate; an e-beam column part inducing the path of the e-beam generated from the electron gun; and an electron collecting part disposed at the periphery of the path of the e-beam projected from the e-beam column part on the resist layer to absorb scattered electrons resulting from emission of the incident e-beam from the resist layer.

REFERENCES:
patent: 6172364 (2001-01-01), Ogasawara et al.
patent: 6326635 (2001-12-01), Innes et al.
patent: 7514682 (2009-04-01), Buller et al.
patent: 7598499 (2009-10-01), Platzgummer
patent: 2001/0016295 (2001-08-01), Choi et al.
patent: 2007/0145269 (2007-06-01), Buller et al.
patent: 10-2004-0002192 (2004-07-01), None

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