Dynamically variable field shaping element

Details Dynamically variable field shaping element Dynamically variable field shaping element

2006-07-04

2006-07-04

Phasge, Arun S. (Department: 1753)

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Controlling current distribution within bath

C205S123000, C205S125000, C205S157000, C205S641000, C204S22400M, C204S244000, C204S212000

Reexamination Certificate

active

07070686

ABSTRACT:
In an electrochemical reactor used for electrochemical treatment of a substrate, for example, for electroplating or electropolishing the substrate, one or more of the surface area of a field-shaping shield, the shield's distance between the anode and cathode, and the shield's angular orientation is varied during electrochemical treatment to screen the applied field and to compensate for potential drop along the radius of a wafer. The shield establishes an inverse potential drop in the electrolytic fluid to overcome the resistance of a thin film of conductive metal on the wafer.

REFERENCES:
patent: 4469566 (1984-09-01), Wray
patent: 5804052 (1998-09-01), Schneider
patent: 6228233 (2001-05-01), Lakshmikanthan et al.
patent: 6254760 (2001-07-01), Shen et al.
patent: 6402923 (2002-06-01), Mayer et al.
patent: 6755954 (2004-06-01), Mayer et al.

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