Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2005-10-28
2009-12-15
Webb, Gregory E (Department: 1796)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S407000
Reexamination Certificate
active
07632796
ABSTRACT:
Improved stripper solutions for removing photoresists from substrates are provided that typically have freezing points below about +15° C. and high loading capacities. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to two different carbon atoms. Some formulation can additionally contain a secondary solvent. Methods for use of the stripping solutions are additionally provided.
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Patent Application Search Report mailed on Jun. 5, 2008.
Chan Raymond
Goebel Gene
Kirkpatrick Lauri Kirby
Phenis Michael T.
Pollard Kimberly Dona
Dynaloy, LLC
Webb Gregory E
Woodard Emhardt Moriarty McNett & Henry LLP
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