Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2005-09-20
2005-09-20
Picard, Leo (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S108000
Reexamination Certificate
active
06947805
ABSTRACT:
Methods of using dynamic metrology sampling techniques for identified lots, and a system for performing such methods are disclosed. In one illustrative embodiment, the method comprises identifying at least one wafer to be processed, identifying a process tool in which at least one wafer is to be processed, obtaining enhanced metrology data regarding a process operation to be performed in the identified process tool prior to processing the identified at least one wafer in the identified process tool, and positioning at least one wafer in the identified process tool and performing the process operation thereon.
REFERENCES:
patent: 5526293 (1996-06-01), Mozumder et al.
patent: 5751580 (1998-05-01), Chi
patent: 6303395 (2001-10-01), Nulman
patent: 6584369 (2003-06-01), Patel et al.
patent: 6587744 (2003-07-01), Stoddard et al.
patent: 6594536 (2003-07-01), Lin et al.
patent: 2002/0193899 (2002-12-01), Shanmugasundram et al.
“Cycle time advantages of mini batch manufacturing integrated metrology in a 300 mm vertical furnace”. Noben et al. Semiconductor Manufacturing Symposium, 2001 International. San Jose Ca. Oct. 8, 2001 - Oct. 10, 2001, pp. 411-414.
Castle Howard E.
Jenkins Naomi M.
Kosowski Alexander
Williams Morgan & Amerson P.C.
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