Dynamic measurement control

Data processing: measuring – calibrating – or testing – Testing system – Of circuit

Reexamination Certificate

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Details

C702S120000, C702S121000, C702S182000

Reexamination Certificate

active

07606677

ABSTRACT:
A metrology recipe includes dynamic instructions that allow a metrology tool to perform a secondary metrology operation on a test wafer when previous measurement data indicates a process issue with that test wafer. The metrology recipe can instruct the metrology tool to perform an efficient default metrology operation on all test wafers, and perform a more in-depth secondary metrology operation on only those wafers that warrant additional scrutiny. In this manner, critical metrology data can be captured with a minimum of effect on metrology throughput. The metrology data used to determine whether or not the secondary metrology operation is to be performed can be generated from default metrology operations within the same tool, or can be generated by measurements taken by a completely different tool. Such “external” metrology data can be received via a communications network, either directly or from a server on the network for processing the metrology data.

REFERENCES:
patent: 6368884 (2002-04-01), Goodwin et al.
patent: 6586755 (2003-07-01), Krivokapic et al.
patent: 6587744 (2003-07-01), Stoddard et al.
patent: 6708075 (2004-03-01), Sonderman et al.
patent: 6925860 (2005-08-01), Poris et al.
patent: 6961636 (2005-11-01), Chong et al.
patent: 2002/0065900 (2002-05-01), Dor et al.

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