Dynamic mask for producing uniform or graded-thickness thin...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C204S192110, C204S298110

Reexamination Certificate

active

07062348

ABSTRACT:
A method for producing single layer or multilayer films with high thickness uniformity or thickness gradients. The method utilizes a moving mask which blocks some of the flux from a sputter target or evaporation source before it deposits on a substrate. The velocity and position of the mask is computer controlled to precisely tailor the film thickness distribution. The method is applicable to any type of vapor deposition system, but is particularly useful for ion beam sputter deposition and evaporation deposition; and enables a high degree of uniformity for ion beam deposition, even for near-normal incidence of deposition species, which may be critical for producing low-defect multilayer coatings, such as required for masks for extreme ultraviolet lithography (EUVL). The mask can have a variety of shapes, from a simple solid paddle shape to a larger mask with a shaped hole through which the flux passes. The motion of the mask can be linear or rotational, and the mask can be moved to make single or multiple passes in front of the substrate per layer, and can pass completely or partially across the substrate.

REFERENCES:
patent: 3636916 (1972-01-01), Thelen et al.
patent: 4303489 (1981-12-01), Morrison, Jr.
patent: 4315960 (1982-02-01), Ohji et al.
patent: 4536419 (1985-08-01), Kubota et al.
patent: 5144498 (1992-09-01), Vincent
patent: 5156727 (1992-10-01), Bjornard et al.
patent: 6093445 (2000-07-01), Nawate
patent: 6197164 (2001-03-01), Pinarbasi
patent: 6303182 (2001-10-01), Eggleton et al.
patent: 64-37586 (1989-02-01), None
M.P. Bruijn et al., Automatic electron-beam deposition of multilayer soft x-ray coatings with laterally graded d-spacing, Optical Engineering, Aug. 1986, vol. 25, No. 8, pp. 916-921.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dynamic mask for producing uniform or graded-thickness thin... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dynamic mask for producing uniform or graded-thickness thin..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dynamic mask for producing uniform or graded-thickness thin... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3645947

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.