Dynamic compensation system for maskless lithography

Details Dynamic compensation system for maskless lithography Dynamic compensation system for maskless lithography

2008-05-06

2008-05-06

Young, Christopher G. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S030000, C430S312000

Reexamination Certificate

active

07368207

ABSTRACT:
A method for dynamically registering multiple patterned layers on a substrate (3) comprises: depositing a first layer on the substrate; printing a first pattern (20) on the first layer; depositing a second layer on the first pattern; and printing a second pattern on the second layer while dynamically detecting the first pattern to align the second pattern with the first pattern.

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patent: 1 482 373 (2004-12-01), None
patent: 7-283110 (1995-10-01), None
Monk et al.; Digital micromirror device for projection display; SPIE vol. 2407, pp. 90-95.
Kuck et al.; Deformable Micromirror Devices as Phase Modulating High Resolution Light Valves; Transducers 95, pp. 301-304.

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