Gas separation: processes – Filtering – With cleaning of filter
Patent
1997-06-23
1999-04-20
Spitzer, Robert
Gas separation: processes
Filtering
With cleaning of filter
55302, 553411, B01D 4604
Patent
active
058955216
ABSTRACT:
A dust removing apparatus equipped with a back washing mechanism and a dust removing method for removing solid silica fine powder contained in a gas discharged from a semiconductor producing step of a single-wafer processing atmospheric pressure CVD apparatus without causing problems caused by the increase of a pressure loss and by a pressure fluctuation, wherein filter elements each having a ratio of a surface area of a primary side of a filter membrane to an apparent external surface area of the filter element of from 1 to 5 is used, gas jetting nozzle(s) for back washing is formed in the secondary side of the filter element, back washing is not carried out during filtration in the filter element and at or after changing the processing of a wafer in the CVD apparatus, back washing is carried out to blow down the silica fine powder accumulated on the primary side of the filter membrane.
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Arakawa Satoshi
Hatakeyama Toshiya
Otsuka Kenji
Waki Hiroshi
Yamashita Yoshio
Japan Pionics Co., Ltd.
Spitzer Robert
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