Dust particle exposure chamber

Measuring and testing – Simulated environment

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

G01N 1700

Patent

active

053817010

ABSTRACT:
This invention is embodied in an apparatus for assessing the effects of controlled amounts of well-characterized ionic or other particles on the reliability of electronic components. The chamber includes a high efficiency filter that purifies the input air and a recirculating system which ensures substantially laminar, constant velocity air flow, controllable humidity, and steady state conditions throughout at least a portion of the chamber. Particles are introduced into the chamber from a particle generator through a series of output ports that ensure a uniform concentration of particles throughout at least a portion of the chamber. Substantially constant conditions are achieved by constantly introducing new particles into the chamber, withdrawing a continuous flow of particle-laden air from the chamber, removing essentially all the particles from the particle-laden air withdrawn from the chamber and introducing a continuous flow of filtered air into the chamber. Additionally provisions for monitoring particle concentrations and size distribution, for controlling the relative humidity in the chamber, and for carrying out electrical aging and testing can be incorporated.

REFERENCES:
patent: 1827530 (1931-10-01), Grand
patent: 2346690 (1944-04-01), Larkins, Jr.
patent: 4799390 (1989-01-01), Kimura
R. B. Comizzoli, et al., "Corrosion of Electronic Materials and Devices", Science, vol. 234, pp. 340-345 (1986).
EIA Standard RS-364-50, "Fest Procedure #50 Sand Dust Test Procedure for Electrical Connectors", Electrical Industries Association, Washington, D.C. 1983.
Department of Defense, MIL-STD-810D, paragraph 510.2, Jul. 19, 1983.
Steenstrup, et al. "A Comparative Study of Inhibited Lubricants For Dry Circuits, Sliding Contacts", Proc. 28th IEEE Holn. Conf., No. 59, p. 59 (1982).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dust particle exposure chamber does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dust particle exposure chamber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dust particle exposure chamber will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-741323

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.