Duplicating film mask with radiation absorbing benzophenone in p

Details Duplicating film mask with radiation absorbing benzophenone in p Duplicating film mask with radiation absorbing benzophenone in p

1982-09-21

1984-12-04

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 13, 430 17, 430 18, 430145, 430165, 430177, 430179, 430302, 430326, 430512, 101470, 101471, 101473, G03F 100, G03C 300, G03C 178

Patent

active

044865180

ABSTRACT:
A non-silver, positive-working, essentially alkali-insoluble, radiation-sensitive composition, which becomes alkali-soluble on exposure to radiation, comprising a non-silver, positive-acting, essentially alkali-insoluble radiation-sensitive component a radiation absorbing component and an essentially alkali-soluble polymeric binder. A radiation-sensitive element comprising a transparent substrate overcoated with said radiation-sensitive composition. A duplicating film comprising the said element prepared by exposing said composition through the substrate and then image-wise exposing said composition through a mask in front of the composition followed by treatment with an alkaline developer to remove those areas of the composition subjected to both exposures.

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patent: 4164421 (1979-08-01), Shinozaki et al.
patent: 4173470 (1979-11-01), Fahrenholtz et al.
patent: 4191573 (1980-03-01), Toyama et al.
patent: 4275139 (1981-06-01), Stahlhofen
patent: 4297428 (1981-10-01), Kobayashi

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