Drying and gas or vapor contact with solids – Process – With nondrying treating of material
Reexamination Certificate
2008-07-01
2008-07-01
Gravini, S. (Department: 3749)
Drying and gas or vapor contact with solids
Process
With nondrying treating of material
Reexamination Certificate
active
07392599
ABSTRACT:
A dummy substrate is obtained by covering a silicon substrate with a resin coating. This increases the strength of the dummy substrate, prevents pieces and particles of the silicon substrate from scattering, and even when the dummy substrate is damaged during processing, prevents them from contaminating a processing apparatus. The use of a chemical-resistant resin for the resin coating restrains the dummy substrate from being etched by a cleaning process using a chemical solution and increases the number of times that the dummy substrate can repeatedly be used.
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Japanese Office Action Issued in corresponding Japanese Patent Application No. JP 2004-084430, dated Nov. 7, 2006.
Gravini S.
Matsushita Electric - Industrial Co., Ltd.
McDermott Will & Emery LLP
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