Dual-wavelength positive-working radiation-sensitive elements

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

Reexamination Certificate

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Details

C430S176000, C430S191000, C430S192000, C430S193000, C430S302000

Reexamination Certificate

active

11157204

ABSTRACT:
A positive-working radiation-sensitive composition for use with a radiation source comprises one or more polymers capable of being eluted in an alkaline aqueous solution and a development-enhancing compound. The invention provides a positive-working photosensitive composition of good sensitivity for use with one or both of ultra-violet radiation and an infrared laser radiation source. The composition is stable in its state before exposure and has an excellent handling property. The sensitivity of a radiation-sensitive coating based on the composition of this invention is increased without compromising the handling characteristics. Radiation-sensitive elements based on the composition of the invention have good development latitude. A positive-working lithographic printing precursor is based on the radiation-sensitive composition coated on a hydrophilic surface. The precursor is developable using an alkaline aqueous solution, and may be used with a radiation source in lithographic applications, such as conventional imaging systems, computer-to-plate systems or other direct imaging applications. The precursor is stable in its state before exposure and has an excellent handling property.

REFERENCES:
patent: 5219699 (1993-06-01), Walls et al.
patent: 5262270 (1993-11-01), Walls
patent: 5316892 (1994-05-01), Walls et al.
patent: 5534381 (1996-07-01), Ali et al.
patent: 5646218 (1997-07-01), Lynch et al.
patent: 5840467 (1998-11-01), Kitatani et al.
patent: 6060217 (2000-05-01), Nguyen et al.
patent: 6060218 (2000-05-01), Van Damme et al.
patent: 6060222 (2000-05-01), West et al.
patent: 6074802 (2000-06-01), Murata et al.
patent: 6110646 (2000-08-01), Urano et al.
patent: 6117613 (2000-09-01), Kawauchi et al.
patent: 6238838 (2001-05-01), Gaschler et al.
patent: 6255033 (2001-07-01), Levanon et al.
patent: 6280899 (2001-08-01), Parsons et al.
patent: 6326122 (2001-12-01), Nagasaka et al.
patent: 6331375 (2001-12-01), Kawamura et al.
patent: 6346365 (2002-02-01), Kawauchi et al.
patent: 6410203 (2002-06-01), Nakamura
patent: 6410207 (2002-06-01), Nagasaka et al.
patent: 6444393 (2002-09-01), Nakamura et al.
patent: 6472119 (2002-10-01), Verschueren et al.
patent: 6485890 (2002-11-01), Parsons et al.
patent: 6506536 (2003-01-01), Pappas et al.
patent: 6537735 (2003-03-01), McCullough et al.
patent: 0 913 253 (1999-05-01), None
patent: WO 03/079113 (2003-09-01), None
patent: WO 2004/020484 (2004-03-01), None
patent: WO 2004/081662 (2004-09-01), None

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