Dual wavelength method of determining a relative position of...

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing

Reexamination Certificate

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C430S030000, C356S399000, C356S400000, C356S401000

Reexamination Certificate

active

06902853

ABSTRACT:
The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having template alignment marks disposed thereon, the method including, impinging first and second fluxes of light upon the substrate and template alignment marks, with the substrate and template alignment marks being responsive to the first flux of light defining a first response, and being responsive to the second flux of light defining a second response differing from the first response; and processing the first and second responses to form a focused image of the substrate and template alignment marks on a common plane, with the focused image indicating the relative position of the substrate and the template.

REFERENCES:
patent: 3783520 (1974-01-01), King
patent: 4070116 (1978-01-01), Frosch et al.
patent: 4119688 (1978-10-01), Hiraoka
patent: 4201800 (1980-05-01), Alcorn et al.
patent: 4426247 (1984-01-01), Tamamura et al.
patent: 4507331 (1985-03-01), Hiraoka
patent: 4552833 (1985-11-01), Ito et al.
patent: 4600309 (1986-07-01), Fay
patent: 4657845 (1987-04-01), Frechet et al.
patent: 4692205 (1987-09-01), Sachdev et al.
patent: 4707218 (1987-11-01), Giammarco et al.
patent: 4737425 (1988-04-01), Lin et al.
patent: 4808511 (1989-02-01), Holmes
patent: 4826943 (1989-05-01), Ito et al.
patent: 4848911 (1989-07-01), Uchida et al.
patent: 4857477 (1989-08-01), Kanamori
patent: 4891303 (1990-01-01), Garza et al.
patent: 4908298 (1990-03-01), Hefferon et al.
patent: 4919748 (1990-04-01), Bredbenner et al.
patent: 4921778 (1990-05-01), Thackeray et al.
patent: 4931351 (1990-06-01), McColgin et al.
patent: 4964945 (1990-10-01), Calhoun
patent: 4976818 (1990-12-01), Hashimoto et al.
patent: 4980316 (1990-12-01), Huebner
patent: 4999280 (1991-03-01), Hiraoka
patent: 5053318 (1991-10-01), Gulla et al.
patent: 5071694 (1991-12-01), Uekita et al.
patent: 5074667 (1991-12-01), Miyatake
patent: 5108875 (1992-04-01), Thackeray et al.
patent: 5148036 (1992-09-01), Matsugu et al.
patent: 5148037 (1992-09-01), Suda et al.
patent: 5151754 (1992-09-01), Ishibashi et al.
patent: 5169494 (1992-12-01), Hashimoto et al.
patent: 5173393 (1992-12-01), Sezi et al.
patent: 5179863 (1993-01-01), Uchida et al.
patent: 5198326 (1993-03-01), Hashimoto et al.
patent: 5212147 (1993-05-01), Sheats
patent: 5234793 (1993-08-01), Sebald et al.
patent: 5240878 (1993-08-01), Fitzsimmons et al.
patent: 5242711 (1993-09-01), DeNatale et al.
patent: 5244818 (1993-09-01), Jokerst et al.
patent: 5314772 (1994-05-01), Kozicki et al.
patent: 5318870 (1994-06-01), Hartney
patent: 5324683 (1994-06-01), Fitch et al.
patent: 5328810 (1994-07-01), Lowrey et al.
patent: 5330881 (1994-07-01), Sidman et al.
patent: 5362606 (1994-11-01), Hartney et al.
patent: 5366851 (1994-11-01), Novembre
patent: 5374454 (1994-12-01), Bickford et al.
patent: 5376810 (1994-12-01), Hoenk et al.
patent: 5380474 (1995-01-01), Rye et al.
patent: 5417802 (1995-05-01), Obeng
patent: 5421981 (1995-06-01), Leader et al.
patent: 5422295 (1995-06-01), Choi et al.
patent: 5424549 (1995-06-01), Feldman
patent: 5431777 (1995-07-01), Austin et al.
patent: 5439766 (1995-08-01), Day et al.
patent: 5453157 (1995-09-01), Jeng
patent: 5458520 (1995-10-01), DeMercurio et al.
patent: 5468542 (1995-11-01), Crouch
patent: 5527662 (1996-06-01), Hashimoto et al.
patent: 5654238 (1997-08-01), Cronin et al.
patent: 5670415 (1997-09-01), Rust
patent: 5700626 (1997-12-01), Lee et al.
patent: 5736424 (1998-04-01), Prybyla et al.
patent: 5743998 (1998-04-01), Park
patent: 5855686 (1999-01-01), Rust
patent: 5895263 (1999-04-01), Carter et al.
patent: 5907782 (1999-05-01), Wu
patent: 5926690 (1999-07-01), Toprac et al.
patent: 5948219 (1999-09-01), Rohner
patent: 5948570 (1999-09-01), Kornblit et al.
patent: 6033977 (2000-03-01), Gutsche et al.
patent: 6035805 (2000-03-01), Rust
patent: 6049373 (2000-04-01), Miyatake
patent: 6096655 (2000-08-01), Lee et al.
patent: 6150231 (2000-11-01), Muller et al.
patent: 6150680 (2000-11-01), Eastman et al.
patent: 6245581 (2001-06-01), Bonser et al.
patent: 6274294 (2001-08-01), Hines
patent: 6285439 (2001-09-01), Miyatake
patent: 6295120 (2001-09-01), Miyatake
patent: 6326627 (2001-12-01), Putvinski et al.
patent: 6329256 (2001-12-01), Ibok
patent: 6383928 (2002-05-01), Eissa
patent: 6387783 (2002-05-01), Furukawa et al.
patent: 6388253 (2002-05-01), Su
patent: 6388755 (2002-05-01), Zhao et al.
patent: 6391798 (2002-05-01), DeFelice et al.
patent: 6455411 (2002-09-01), Jiang et al.
patent: 6482742 (2002-11-01), Chou
patent: 6489068 (2002-12-01), Kye
patent: 6514672 (2003-02-01), Young et al.
patent: 6534418 (2003-03-01), Plat et al.
patent: 6541360 (2003-04-01), Plat et al.
patent: 6561706 (2003-05-01), Singh et al.
patent: 6565928 (2003-05-01), Sakamoto et al.
patent: 6632742 (2003-10-01), Yang et al.
patent: 6635581 (2003-10-01), Wong
patent: 6646662 (2003-11-01), Nebashi et al.
patent: 6677252 (2004-01-01), Marsh
patent: 6703190 (2004-03-01), Elian et al.
patent: 6716767 (2004-04-01), Shih et al.
patent: 6730256 (2004-05-01), Bloomstein et al.
patent: 6737202 (2004-05-01), Gehoski et al.
patent: 6743713 (2004-06-01), Mukherjee-Roy et al.
patent: 6676983 (2004-07-01), Fujiyama et al.
patent: 6770852 (2004-08-01), Steger
patent: 6776094 (2004-08-01), Whitesides et al.
patent: 6777170 (2004-08-01), Bloomstein et al.
patent: 2002/0132482 (2002-09-01), Chou
patent: 2002/0167117 (2002-11-01), Chou
patent: 2003/0011368 (2003-01-01), Mancini et al.
patent: 2003/0080471 (2003-05-01), Chou
patent: 2003/0081193 (2003-05-01), White et al.
patent: 2003/0129542 (2003-07-01), Shih et al.
patent: 2004/0029041 (2004-02-01), Shih et al.
patent: 2004/0036201 (2004-02-01), Chou et al.
patent: 55-88332 (1978-12-01), None
patent: 57-7931 (1980-06-01), None
patent: 63-138730 (1986-12-01), None
patent: 02-24848 (1990-01-01), None
patent: 02-92603 (1990-04-01), None
patent: WO 00/21689 (2000-04-01), None
patent: WO 01/47003 (2001-06-01), None
Abstract of Japanese Patent 63-138730.
Abstract of Japanese Patent 55-88332.
Abstract of Japanese Patent 57-7931.
Abstract of Japanese Patent 02-92603.
Translation of Japanese Patent 02-92603.
Abstract of Japanese Patent 02-24848.
Translation of Japanese Patent 02-24848.
Heidari et al., “Nanoimprint Lithography at the 6 in. Wafer Scale,” Journal of Vacuum Science Technology, Nov./Dec. 2000, pp. 3557-3560, vol. B, No. 18(6)/.
NERAC.COM Retro Search, “Reduction of Dimension of Contact Holes”, Aug. 31, 2004.
NERAC.COM Retro Search, “Trim Etching of Features Formed on an Organic Layer”, Sep. 2, 2004.
NERAC.COM Retro Search, “Multi-Layer Resists”, Sep. 2, 2004.
Hu et al., “Flourescence Probe Techniques (FPT) for Measuring the Relative Efficiencies of Free-Radical Photoinitiators”, s0024-9297(97)01390-9;“Macromolecules” 1998, vol. 31, No. 13, pp. 4107-4113, 1998 American Chemical Society. Published on Web May 29, 1998.
Feynman, Richard P., “There's Plenty of Room at the Bottom—An Invitation to Enter a New Field of Physics,” 12 pp [online]Retreived Sep. 23, 2004 from URI:http://www.zyvex.com
anotech/feynman.html.
Ciba Specialty Chemicals Business Line Coatings, “What is UV Curing?”, 45 pp [online]Retreived Sep. 24, 2004 from URL:http//www.cibasc.com/image.asp?id=4040.
Communication Relating to the Results of the Partial International Search; International Appl. No. PCT/US2002/015551.

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