Dual vertical thermal processing furnace

Heating – Work feeding – agitating – discharging or conveying... – Removable furnace bottom section or kiln cart

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

432253, F27D 500

Patent

active

059613238

ABSTRACT:
A vertical semiconductor wafer processing furnace that includes a single housing having first and second vertical furnaces each having a heating chamber for heat treating a semiconductor wafer. The first and second vertical furnaces are asymmetrically disposed relative to each other to reduce the overall footprint of the processing furnace. Each vertical furnace includes a wafer support assembly that includes support structure, such as a wafer boat, boat elevator, motor and guide rod, for axially mounting a selected number of semiconductor wafers. A translation element selectively moves one of the support elements along the vertical axis into and out of the process tube, and a wafer transfer element selectively transfers semiconductor wafers to or from one of the support elements. The furnace further includes a heating sleeve or envelope that is adapted to control the ambient fluid environment surrounding the support structure and which is independently movable relative to support structure. The heating sleeve is adapted to sealingly engage a portion of the support element to create a fluid-tight seal forming a loadlock processing assembly. This assembly is coupled to a vertical translation assembly that selectively, vertically moves the processing assembly into the heating chamber of the vertical furnace. Additionally, the heating sleeve an be vertically moved relative to the support structure to engage and disengage repetitively, easily and automatically the heating sleeve relative to the support structure.

REFERENCES:
patent: 5041719 (1991-08-01), Harris et al.
patent: 5057287 (1991-10-01), Swiggard
patent: 5162047 (1992-11-01), Wada et al.
patent: 5180273 (1993-01-01), Sakaya et al.
patent: 5217501 (1993-06-01), Fuse et al.
patent: 5245158 (1993-09-01), Hashizume et al.
patent: 5387265 (1995-02-01), Kakizaki et al.
patent: 5407350 (1995-04-01), Iwabuchi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dual vertical thermal processing furnace does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual vertical thermal processing furnace, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual vertical thermal processing furnace will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1163356

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.