Dual-valent rare earth additives to polishing slurries

Details Dual-valent rare earth additives to polishing slurries Dual-valent rare earth additives to polishing slurries

1996-11-27

2000-08-29

Kunemund, Robert

Etching a substrate: processes

Nongaseous phase etching of substrate

Using film of etchant between a stationary surface and a...

216 89, 216 97, 216 99, 216100, 438959, 438692, 438693, H01L 2144

Patent

active

061103969

ABSTRACT:
A slurry containing abrasive particles and a dual-valent rare earth ion or suspension of its colloidal hydroxide is especially useful for polishing surfaces, including those used in microelectronics. A suspension of a colloidal dual-valent rare earth hydroxide is especially useful for polishing silica.

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patent: 5603739 (1997-02-01), Neuland
patent: 5639296 (1997-06-01), Carino

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