Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-03-02
1992-02-11
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430190, 430191, 430325, G03F 7023, G03C 161
Patent
active
050875477
ABSTRACT:
The resolution and stability of liquid, dual-tone photoresist formulations containing novolac resins and photoactive compounds are enhanced by the incorporation therein of certain carbodiimide resolution enhancers.
REFERENCES:
patent: 4104070 (1978-08-01), Moritz et al.
patent: 4377633 (1983-03-01), Abrahanovich et al.
patent: 4546066 (1985-10-01), Field et al.
patent: 4797348 (1989-01-01), Nakamura et al.
Noller, Textbook of Organic Chemistry, 2nd Edition, 1958, pp. 246-247.
Bassett David R.
Taylor James W.
Bowers Jr. Charles L.
Leuzzi, II Paul W.
Union Carbide Chemicals & Plastics Technology Corporation
Young Christopher G.
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