Dual target cathode assembly with shielding

Details Dual target cathode assembly with shielding Dual target cathode assembly with shielding

1995-11-07

1999-08-31

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429812, 20429819, 20429826, C23C 1434

Patent

active

059449675

ABSTRACT:
A dual magnetron cathode assembly includes a pair of elongate, parallel targets in coplanar relationship fixed to respective magnetic yokes with associated rows of permanent magnets for producing a magnetic field over the targets. A common back plate is provided for both cathodes, a center shield plate extending from the back plate to between the targets, side shield plates and end shield plates likewise extending from the back plate to form side-by-side rectangular shielding enclosures which expose only the sputtering surface of the targets. The yokes are fixed with respect to the vacuum chamber by insulative holders which extend through openings in the back plate.

REFERENCES:
patent: 4169031 (1979-09-01), Brors

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