Dual substrate, single-pass printing process

Details Dual substrate, single-pass printing process Dual substrate, single-pass printing process

1994-12-02

1996-03-26

Funk, Stephen

Printing

Antismut device

101417, 101181, 101211, B41F 518, B41F 2200

Patent

active

055011497

ABSTRACT:
A dual substrate, single-pass printing process prints a high basis weight substrate and a low basis weight substrate. Ink striking through the low basis weight substrate is collected and absorbed by the high basis weight substrate. The printed substrates are then separated and rewound for subsequent transport and handling.

REFERENCES:
patent: 364029 (1887-05-01), Macnab
patent: 1639218 (1927-08-01), Ebersol
patent: 2111613 (1938-03-01), Bulford
patent: 2175051 (1939-10-01), Bromley
patent: 2504021 (1950-04-01), Heinrich
patent: 2743206 (1956-04-01), Verduin
patent: 3442211 (1969-05-01), Beacham
patent: 3978789 (1976-09-01), Fennekels et al.
patent: 4069822 (1978-01-01), Buell
patent: 4147580 (1979-04-01), Buell
patent: 5086700 (1992-02-01), Van Den Berg

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