Dual source XRF system

Details Dual source XRF system Dual source XRF system

2006-12-27

2008-10-21

Song, Hoon (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Fluorescence

C378S047000

Reexamination Certificate

active

07440541

ABSTRACT:
A dual source tube XRF system and method wherein a first x-ray source is employed to direct x-rays in a first energy band at a sample and at least a second x-ray source is employed to direct x-rays in a second energy band at the sample. A detector is responsive to x-rays emitted by the sample after irradiation by the first and second x-ray sources. An analyzer is responsive to the detector and is configured to determine the amount of at least a first substance in the sample based on irradiation of the sample by the first x-ray source and to determine the amount of at least a second substance in the sample based on irradiation of the sample by the second x-ray source. A controller is responsive to the analyzer and is configured to energize the first and second x-ray sources either simultaneously or sequentially.

REFERENCES:
patent: 4599741 (1986-07-01), Wittry
patent: 5657363 (1997-08-01), Hossain et al.
patent: 6859517 (2005-02-01), Wilson et al.
patent: 7099433 (2006-08-01), Sommer et al.
patent: 2007/0030953 (2007-02-01), Sommer et al.
patent: 01156646 (1989-06-01), None

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