Dual port lance and method

Details Dual port lance and method Dual port lance and method

1991-11-12

1993-02-23

Andrews, Melvyn J.

Specialized metallurgical processes, compositions for use therei

Processes

Process control responsive to sensed condition

266 83, 266225, 75533, C21C 532

Patent

active

051886618

ABSTRACT:
A apparatus is disclosed which is utilized for treatment of molten metal contained in a vessel by injection of powdered reagent below the surface of the molten metal which includes an elongated lance body containing longitudinal conduits for delivery of the powdered reagent below the surface of the molten metal, a first and second reagent supply device and a control device which independently regulates the flow of the reagent in a pressure stream of gases through the conduits. The first and second reagent supply device provides the reagent which is injected into a pressure stream by the control device. Each of the flows through the conduits are regulated independent of one another in order to prevent clogging of the exit ports of the conduits while eliminating any splash and turbulence.

REFERENCES:
patent: 1205611 (1916-11-01), Ford
patent: 2806781 (1957-09-01), Shepherd et al.
patent: 3792849 (1974-02-01), Kosmider et al.
patent: 4248409 (1981-02-01), Langlitz et al.
patent: 4261551 (1981-04-01), Fassbinder
patent: 4264059 (1981-04-01), Benatar
patent: 4518422 (1985-05-01), Metz
patent: 4575393 (1986-03-01), Bates et al.
patent: 4613113 (1986-09-01), Saito et al.
patent: 4740241 (1988-04-01), LaBate
patent: 4799651 (1989-01-01), Lazcano-Navarro et al.

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