Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – For liquid etchant
Reexamination Certificate
2005-03-08
2005-03-08
Zervigon, Rudy (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
For liquid etchant
C156S345150, C156S345240, C156S345250, C118S715000, C118S663000, C118S712000, C118S713000
Reexamination Certificate
active
06863772
ABSTRACT:
A dual-port endpoint detection window for a process chamber for substrates. The dual-port endpoint detection window of the present invention comprises a primary port and a secondary port each of which may be individually removably fitted with a light sensor for the endpoint detection system. A cover is provided for removably covering the secondary port. After the window of the primary port has become covered with material deposition as a result of prolonged use of the process chamber, the secondary port is uncovered for use and the light sensor is attached to the secondary port for continued use of the endpoint detection system through the secondary port.
REFERENCES:
patent: 4407709 (1983-10-01), Enjouji et al.
patent: 4491499 (1985-01-01), Jerde et al.
patent: 4836140 (1989-06-01), Koji
patent: 4857136 (1989-08-01), Zajac
patent: 4982693 (1991-01-01), Ebata
patent: 5002631 (1991-03-01), Giapis et al.
patent: 5255286 (1993-10-01), Moslehi et al.
patent: 5290383 (1994-03-01), Koshimizu
patent: 5317656 (1994-05-01), Moslehi et al.
patent: 5322590 (1994-06-01), Koshimizu
patent: 5352902 (1994-10-01), Aoki
patent: 5473162 (1995-12-01), Busch et al.
patent: 5508934 (1996-04-01), Moslehi et al.
patent: 5534066 (1996-07-01), O'Neill et al.
patent: 5728253 (1998-03-01), Saito et al.
patent: 5759424 (1998-06-01), Imatake et al.
patent: 5837094 (1998-11-01), Tsukazaki et al.
patent: 5880823 (1999-03-01), Lu
patent: 6042650 (2000-03-01), Uesugi et al.
patent: 6074568 (2000-06-01), Adachi et al.
patent: 6077387 (2000-06-01), Tesauro
patent: 6176933 (2001-01-01), Yang
patent: 6191397 (2001-02-01), Hayasaki et al.
patent: 6207008 (2001-03-01), Kijima
patent: 6235119 (2001-05-01), Yang
patent: 6284049 (2001-09-01), Uesugi et al.
patent: 6306246 (2001-10-01), Melvin et al.
patent: 6537832 (2003-03-01), Otsubo et al.
patent: 6547458 (2003-04-01), Janos et al.
patent: 6562186 (2003-05-01), Saito et al.
patent: 6603101 (2003-08-01), Hayasaki et al.
patent: 6712928 (2004-03-01), Nakano et al.
patent: 20030054657 (2003-03-01), Kim
patent: 58006124 (1983-01-01), None
patent: 62196818 (1987-08-01), None
Chang Jung-Hsiang
Cheng Ping-Jen
Tzeng Huan-Liang
Taiwan Semiconductor Manufacturing Co. Ltd
Tung & Associates
Zervigon Rudy
LandOfFree
Dual-port end point window for plasma etcher does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dual-port end point window for plasma etcher, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual-port end point window for plasma etcher will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3379570