Dual photo-acoustic and resistivity measurement system

Details Dual photo-acoustic and resistivity measurement system Dual photo-acoustic and resistivity measurement system

2008-05-13

2008-05-13

Punnoose, Roy M (Department: 2886)

Optics: measuring and testing

Dimension

Thickness

C356S632000

Reexamination Certificate

active

07372584

ABSTRACT:
A measurement system for measuring aspects of a wafer combines an apparatus for performing a conductivity measurement, such as a four-point probe system, with apparatus for performing an optical measurement, such as a photoacoustic measurement system. Results are obtained and combined to provide comprehensive data sets describing the characteristics of the thin film substrate therein.

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