Dual phase grating alignment marks

Details Dual phase grating alignment marks Dual phase grating alignment marks

2005-03-08

2005-03-08

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C356S401000, C356S508000

Reexamination Certificate

active

06864956

ABSTRACT:
A method for aligning a substrate on a lithographic apparatus includes providing a substrate having a first plurality of grating marks optimized for a beam of a first given diffraction order and a second plurality of grating marks optimized for a beam of a second given diffraction order on a lithographic apparatus. A first signal is generated using a first beam reflected from the first grating marks, the first beam being a beam of the first given diffraction order. A second signal is generated using a second beam reflected from the second grating marks, the second beam being a beam of the second given diffraction order. The substrate is aligned with respect to the apparatus using the first and second signals.

REFERENCES:
patent: 5716889 (1998-02-01), Tsuji et al.
patent: 6228743 (2001-05-01), Chen et al.
patent: 6235437 (2001-05-01), Neoh et al.
patent: 6239031 (2001-05-01), Kepler et al.
patent: 6288454 (2001-09-01), Allman et al.
patent: 6297876 (2001-10-01), Bornebroek
patent: 6352904 (2002-03-01), Tan et al.
patent: 6452662 (2002-09-01), Mulkens et al.
patent: 20020080365 (2002-06-01), Monshouwer et al.
Navarro, R. et al. (2001). “Extended Athena Alignment Performance and Application for the 100 NM Technology Node,” SPIE, The 26th Annual International Symposium on Microlithography, Feb. 25-Mar. 2, 2001, 1-10.

Affiliated with

Also associated with

Rating

Dual phase grating alignment marks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual phase grating alignment marks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual phase grating alignment marks will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3375101