Dual phase grating alignment marks

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S067000, C356S401000, C356S508000

Reexamination Certificate

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06864956

ABSTRACT:
A method for aligning a substrate on a lithographic apparatus includes providing a substrate having a first plurality of grating marks optimized for a beam of a first given diffraction order and a second plurality of grating marks optimized for a beam of a second given diffraction order on a lithographic apparatus. A first signal is generated using a first beam reflected from the first grating marks, the first beam being a beam of the first given diffraction order. A second signal is generated using a second beam reflected from the second grating marks, the second beam being a beam of the second given diffraction order. The substrate is aligned with respect to the apparatus using the first and second signals.

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patent: 20020080365 (2002-06-01), Monshouwer et al.
Navarro, R. et al. (2001). “Extended Athena Alignment Performance and Application for the 100 NM Technology Node,” SPIE, The 26th Annual International Symposium on Microlithography, Feb. 25-Mar. 2, 2001, 1-10.

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