Dual-mode electron beam lithography machine

Details Dual-mode electron beam lithography machine Dual-mode electron beam lithography machine

2006-05-30

2006-05-30

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492220, C250S3960ML, C430S296000

Reexamination Certificate

active

07053388

ABSTRACT:
A dual-mode electron beam lithography machine (10) comprises an electron beam column (11) for generating an electron beam (12) for writing a pattern on a surface of a substrate14) by way of a writing current, the substrate being supported on a stage (13) movable to displace the substrate relative to the beam. The column (10) includes beam deflecting plates (16) for deflecting the beam to scan the substrate surface in accordance with the pattern to be written and beam blanking plates (15) for blanking the beam to interrupt writing. The machine further comprises control means (17to20) for changing each of writing current, stage movement, beam deflection and beam blanking between a predetermined first mode optimised for pattern-writing accuracy, thus resolution, and a predetermined second mode different from the first mode and optimised for pattern-writing speed, thus throughput.

REFERENCES:
patent: 6288406 (2001-09-01), Penberth et al.
patent: 6320198 (2001-11-01), Ito et al.
patent: 2004/0119021 (2004-06-01), Parker et al.
patent: 2 328 073 (1999-02-01), None
patent: 11297254 (1999-10-01), None

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