Dual look ahead mask generator

Details Dual look ahead mask generator Dual look ahead mask generator

1988-03-14

1990-07-31

Eng, David Y.

Boots, shoes, and leggings

3649474, G06F 700

Patent

active

049455095

ABSTRACT:
A mask generator for generating a mask having logical signals of a given level between positions indicated by beginning and ending addresses. Two decoders select respective binary signal lines indicating the starting and ending positions. The mask generator is composed of two mask generators operating on the higher and lower order binary signal lines respectively and which ripple from the ends of the mask towards the middle. Preferably, each of the dual mask generators has look-ahead carry capability.

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patent: 4064421 (1977-12-01), Gajski et al.
patent: 4139899 (1979-02-01), Tulpule et al.
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patent: 4317171 (1982-02-01), Maejima et al.
patent: 4654785 (1987-03-01), Nishiyama et al.
patent: 4760517 (1988-07-01), Miller et al.
patent: 4785393 (1988-11-01), Chu et al.
IBM Technical Disclosure Bulletin, vol. 26, No. 1, Jun. 1983 S. Barret, J. Bula, A. A. Dean and A. Furman.
IBM Technical Disclosure Bulletin, vol. 27, No. 10A Mar. 1985, Anonymous.
IBM Technical Disclosure Bulletin, vol. 19, No. 7, Dec. 1976, F. T. Blount.

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