Dual ion beam ballistic alloying process

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 35, 427309, 427249, 24019211, 24029804, 423446, B05D 306, C23C 1400

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050553186

ABSTRACT:
The invention relates to a low temperature, dual beam vacuum deposition process for forming a hard, stress reduced, ballistically alloyed film such as diamond onto a substrate.

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Weissmantel, "Ion Beam Deposition of Special Film Structures", J. Vac. Sci. Technol., vol. 18, No. 2, Mar. 1981, pp. 179-185.

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