Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1988-10-11
1991-02-12
Morgenstern, Norman
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 35, 427249, 427309, 20419211, 20429804, 423446, B05D 306, C23C 1400
Patent
active
049922980
ABSTRACT:
The invention discloses a dual ion beam ballistic alloying process for forming a film such as diamond onto a substrate, which comprises the steps of: (a) cleaning the surface of the substrate with a first energy beam of inert atoms; (b) depositing a layer of a desired non-hydrocarbon substance on the substrate with a low energy, sputtered atomic beam; (c) simultaneously exposing the substrate to said first energy beam of inert atoms with a high energy to grow a ballistically alloyed layer having a thickness of about 10-2000 .ANG.; and (d) reducing the energy level of the first, high energy beam to cause the growth of the layer of said substance on said substrate to a final desired thickness.
REFERENCES:
patent: 3961103 (1976-07-01), Aisenberg
patent: 4142958 (1979-03-01), Wei et al.
patent: 4191735 (1980-04-01), Nelson
patent: 4434188 (1984-11-01), Kamo
patent: 4437962 (1984-11-01), Banks
patent: 4444805 (1984-03-01), Corbett
patent: 4490229 (1984-02-01), Mirtich
patent: 4495044 (1985-06-01), Banks
patent: 4504519 (1985-12-01), Zelez
patent: 4603082 (1986-02-01), Zelez
patent: 4725345 (1988-01-01), Sakamoto
patent: 4728529 (1988-03-01), Etzkorn
patent: 4759948 (1988-03-01), Hashimoto
patent: 4793908 (1988-12-01), Scott et al.
patent: 4844785 (1989-07-01), Kitabatane et al.
Weissmantel, "Ion Beam Deposition of Special Film Structures", J. Vac. Sci. Techol., vol. 18, No. 2, Mar. 1981, pp. 179-185.
Deutchman Arnold H.
Partyka Robert J.
BeamAlloy Corporation
King Roy V.
Millard Sidney W.
Morgenstern Norman
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