Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Reexamination Certificate
2005-05-31
2005-05-31
Padgett, Marianne (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
C427S564000, C427S523000, C117S092000, C117S103000, C117S108000
Reexamination Certificate
active
06899928
ABSTRACT:
The present invention is directed towards a process and apparatus for epitaxial deposition of a material, e.g., a layer of MgO, onto a substrate such as a flexible metal substrate, using dual ion beams for the ion beam assisted deposition whereby thick layers can be deposited without degradation of the desired properties by the material. The ability to deposit thicker layers without loss of properties provides a significantly broader deposition window for the process.
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Arendt Paul N.
Groves James R.
Hammond Robert H.
Cottrell Bruce H.
Padgett Marianne
The Regents of the University of California
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