Dual-imaging optical system

Optical: systems and elements – Lens – With reflecting element

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Details

359364, 359365, 359727, 355 53, G02B 1708, G03B 2742

Patent

active

061574988

ABSTRACT:
An optical imaging system especially for microlithography includes a first imaging system forming an intermediate image of an object, and a second imaging system forming, on a surface, an image of the intermediate image. A reflective surface directs light from the first imaging system to the second imaging system. An aspherical corrective optical surface is located at or near the location of the intermediate image for correcting aberrations such as high-order distortion, aberrations due to accumulation of manufacturing tolerances, and spherical aberration. The first imaging system comprises a positive power refractive element and a concave mirror. The second imaging system comprises refractive elements and no concave mirror.

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