Dual gas sensor having solid electrolyte contained in an oxide m

Details Dual gas sensor having solid electrolyte contained in an oxide m Dual gas sensor having solid electrolyte contained in an oxide m

1989-01-25

1990-02-20

Tung, T.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204412, 204424, 427 58, 427431, 4274432, G01N 2746

Patent

active

049024019

ABSTRACT:
A solid electrolyte dual gas sensor (10) is made, containing a container body of a first solid electrolyte (11), in contact with a monitor electrode (17) exposed to a monitored gas environment (13) containing selected gas components to be measured and in contact with a reference electrode (15) which is additionally isolated from the monitored gas environment by a second solid electrolyte section (16), and optionally section (14), where the solid electrolyte section (16) is disposed within a ceramic oxide matrix material (25) where the matrix contains interconnected pores filled with electrolyte, and where the second solid electrolyte, at the operating temperature of the gas sensor, is effective to dissociate to provide the sole source of self-generated reference gases at the reference electrode (15).

REFERENCES:
patent: 3120456 (1964-02-01), Broers
patent: 3268365 (1966-08-01), McQuade et al.
patent: 3915830 (1975-10-01), Isenberg
patent: 4388155 (1983-06-01), Chamberland et al.
patent: 4391690 (1983-07-01), Lin et al.
patent: 4394240 (1983-07-01), Pebler
patent: 4427525 (1984-01-01), Lin et al.
patent: 4744954 (1988-05-01), Campbell et al.

Affiliated with

Also associated with

Rating

Dual gas sensor having solid electrolyte contained in an oxide m does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual gas sensor having solid electrolyte contained in an oxide m, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual gas sensor having solid electrolyte contained in an oxide m will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1614523