Dual filament ion source with improved beam characteristics

Details Dual filament ion source with improved beam characteristics Dual filament ion source with improved beam characteristics

1984-09-13

1986-08-26

Moore, David K.

Electric lamp and discharge devices

With positive or negative ion acceleration

31511191, H05H 0000

Patent

active

046085130

ABSTRACT:
A Freeman type electron bombardment ion source includes dual filament electrodes positioned in an arc chamber having a slit for extraction of an ion beam. The filament electrodes are symmetrically positioned with respect to the extraction slit. The filament electrode currents are equal in magnitude and oppositely directed. As a result, lateral magnetic fields in the region of the extraction slit are substantially eliminated.

REFERENCES:
patent: 2848622 (1958-08-01), Oppenheimer
patent: 2874296 (1959-02-01), Lofgren
patent: 3483423 (1969-12-01), Hanks
patent: 4288716 (1981-09-01), Hinckel et al.
patent: 4412153 (1983-10-01), Kalbfus et al.

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