Dual filament ion source

Details Dual filament ion source Dual filament ion source

1981-08-14

1983-10-25

Dixon, Harold A.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

250427, 31511191, 313453, H01J 724

Patent

active

044121539

ABSTRACT:
An electron bombardment ion source of the Freeman type incorporates an electrode having multiple segments which are electrically connected in parallel to provide increased surface area for constant cross section.

REFERENCES:
patent: 3484602 (1969-12-01), McIlraith
patent: 3701915 (1972-10-01), Tsujimoto
patent: 3784858 (1974-01-01), Franks
Gas Discharge Ion Source by Bickes et al. Rev. Sci. Inst., vol. 49, No. 11, Nov. 1978, pp. 1513-1517.

Affiliated with

Also associated with

Rating

Dual filament ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual filament ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual filament ion source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-714326