Dual exposure method of forming a matrix for an electrophotograp

Details Dual exposure method of forming a matrix for an electrophotograp Dual exposure method of forming a matrix for an electrophotograp

1992-01-27

1993-07-20

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Producing cathode-ray tube or element thereof

Using specified radiation-sensitive composition other than a...

430 23, 430 29, G03C 500

Patent

active

052292347

ABSTRACT:
In an electrophotographic process for manufacturing a luminescent screen assembly on an interior surface of a faceplate panel of a CRT, the panel is first coated with a conductive layer and then overcoated with a photoconductive layer. A substantially uniform charge is established on the photoconductive layer. Selected areas of the photoconductive layer are exposed to actinic radiation, through a shadow mask, to affect the charge on the layer. The unexposed areas of the photoconductive layer are developed with triboelectrically-charged, dry-powdered, light-absorptive screen structure material. The photoconductive layer is reexposed to further discharge those open areas free of the light absorptive material while retaining the charge on those areas having light absorptive matrix material thereon. The reexposure increases the voltage contrast between the exposed and the unexposed areas of the photoconductive layer. A second development of the unexposed areas of the photoconductive layer deposits additional light-absorptive screen structure material on the previously deposited material to increase the opacity of the matrix formed thereby.

REFERENCES:
patent: 4448866 (1984-05-01), Olieslagers et al.
patent: 4921767 (1990-05-01), Datta et al.
patent: 5028501 (1991-07-01), Ritt et al.
U.S. patent application Ser. No. 565,828 filed on Aug. 13, 1990 by Datta et al.

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